Photosensitive polymer composition

U.S. Patent Number: 5292619

Abstract: A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): ##STR1## wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): ##STR2## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.

Inventors: Okinoshima; Hiroshige (Annaka, JP), Kato; Hideto (Takasaki, JP)

Assignee: Shin-Etsu Chemical Co., Ltd. (Tokyo, JP)

Application Number: 07/853,683

Issued: 1994-03-08

Expired: 2006-03-08

Classes: 430/283.1 ; 430/281.1; 522/137; 522/142; 522/162

Field of search: 430/283,281 522/137,142,162

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