Radiation microscope

U.S. Patent Number: 5331456

Abstract: An X-ray microscope is equipped with an X-ray source generating radiation including X rays ranging in wavelength from 400 to 600 .ANG., a beam splitter composed of a thin film which reflects a part of the X rays from the X-ray source and transmits the remainder, an objective, and an X-ray detector. Thus, the X-ray microscope allows the reflected radiation from an sample to be observed in a soft X-ray region, and enables high resolution microscopy even in a thick sample.

Inventors: Horikawa; Yoshiaki (Hachiouji, JP)

Assignee: Olympus Optical Co., Ltd. (Tokyo, JP)

Application Number: 07/986,763

Issued: 1994-07-19

Expired: 2006-07-19

Classes: 359/350 ; 250/372; 359/352

Field of search: 378/84,73,70,43,71,87,34,35,62 359/350,352,355,361,368,382 250/372

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