Apparatus for use with analytical measuring instruments using electromagnetic radiation analysis methods

U.S. Patent Number: 5350923

Abstract: A method and apparatus for use in performing non-contact analytical evaluation of a semiconductor wafer, which needs to be kept clean, to be performed outside of clean room facilities. The apparatus maintains a clean environment surrounding the semiconductor wafer and a portion of the apparatus is substantially transparent to a probe beam of electromagnetic radiation such as X-rays and visible light. The invention substantially overcomes the expenses associated with locating analytical test equipment for testing semi-conductor wafers within clean room facilities.

Inventors: Bassignana; Isabella C. (Ottawa, CA), Kovats; Tibor F. I. (Ottawa, CA)

Assignee: Northern Telecom Limited (Montreal, CA)

Application Number: 07/996,411

Issued: 1994-09-27

Expired: 2006-09-27

Classes: 250/453.11 ; 356/244; 378/161; 378/79

Field of search: 250/453.11 378/161,70,79,80 356/244

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