Exposing apparatus

U.S. Patent Number: 5381210

Abstract: An exposing apparatus which has an alignment apparatus for detecting the relative positional relation between a mask having a pattern for transfer formed thereon and a photosensitive substrate having an alignment mark thereon by applying alignment light to the alignment mark and which exposes the photosensitive substrate to exposure light transmitted through the pattern for transfer, through a projection optical system includes an alignment optical system for causing the alignment light to pass at least once through the projection optical system, the alignment light being of a wavelength in the vicinity of three times the wavelength of the exposure light.

Inventors: Hagiwara; Shigeru (Kawasaki, JP)

Assignee: Nikon Corporation (Tokyo, JP)

Application Number: 08/160,950

Issued: 1995-01-10

Expired: 2007-01-10

Classes: 355/53 ; 250/548; 356/401

Field of search: 355/53,67 356/401 250/548

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