Plasma jet CVD apparatus for forming diamond films

U.S. Patent Number: 5382293

Abstract: An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode of opposite polarity positioned in the nozzle. The apparatus additionally includes a power source for applying a direct current voltage between the electrodes. A gas is fed between the electrodes as a direct current voltage is applied thereto, whereby the gas is formed into a thermal plasma which is jetted through the nozzle. A starting gas feed system is included for feeding gaseous starting compounds for vapor phase deposition to the plasma jet and a powder supplying pipe is provided for feeding a metal powder between the electrodes.

Inventors: Kawarada; Motonobu (Sagamihara, JP), Kurihara; Kazuaki (Atsugi, JP), Sasaki; Ken-ichi (Atsugi, JP), Teshima; Akitomo (Isehara, JP), Koshino; Nagaaki (Yokohama, JP)

Assignee: Fujitsu Limited (Kawasaki, JP)

Application Number: 08/098,106

Issued: 1995-01-17

Expired: 2007-01-17

Classes: 118/723DC ; 118/729; 118/730; 423/446; 427/255.5; 427/577

Field of search: 118/723DC,730,729 427/577,255.5 423/446 156/DIG.68

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