Exposure unit and method for exposing photosensitive materials

U.S. Patent Number: 5386268

Abstract: An exposure unit and method for imaging a photosensitive material includes a source of radiation for exposing the photosensitive material to actinic radiation such that the radiation strikes the photosensitive material at a plurality of angles of incidence, and apparatus for moving the radiation source relative to and in a plane parallel to the photosensitive material. The exposure unit also has a reflector for controlling (1) the proportion of (a) radiation having perpendicular angles of incidence to (b) radiation having non-perpendicular angles of incidence, such that the radiation having non-perpendicular angles is increased, and (2) the distribution of non-perpendicular angles of incidence.

Inventors: Ohlig; Albert H. (Costa Mesa, CA), Nelson; Steven W. (Orange, CA), Verbiar; Robert J. (West Chester, PA), Cushner; Stephen (Lincroft, NJ)

Assignee: E. I. Du Pont de Nemours and Company (Wilmington, DE)

Application Number: 08/097,145

Issued: 1995-01-31

Expired: 2007-01-31

Classes: 355/70 ; 355/84

Field of search: 355/84,97,108,119,233,50,51,71,67

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