Method for selective formation of a deposited film

U.S. Patent Number: 5393646

Abstract: A method for selective formation of a deposited film comprises forming selectively a deposited film of a desired pattern on a deposition surface comprising a plurality of different kinds of materials formed corresponding to said pattern and providing different nucleus forming densities to the deposited film forming material.

Inventors: Yonehara; Takao (Atsugi, JP)

Assignee: Canon Kabushiki Kaisha (Tokyo, JP)

Application Number: 08/003,693

Issued: 1995-02-28

Expired: 2007-02-28

Classes: 430/313 ; 257/E21.131; 257/E21.297; 257/E21.572; 430/314; 430/317; 430/323

Field of search: 430/313,314,317,323 427/250,252,253,255,248.1,259,261 156/612

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