Exposure apparatus and method of exposure using the same

U.S. Patent Number: 5394219

Abstract: A first window portion is provided in a predetermined portion on a substrate where pellicle films of a photomask are not provided, and a second window portion is provided in a predetermined portion on substrate where pellicle films of the photomask are provided. By comparing amounts of exposure luminous flux transmitting first and second window portions it is possible to determine the life of pellicle films and the life of an exposure light source.

Inventors: Hirosue; Miyuki (Hyogo, JP)

Assignee: Mitsubishi Denki Kabushiki Kaisha (Tokyo, JP)

Application Number: 08/055,002

Issued: 1995-02-28

Expired: 2007-02-28

Classes: 355/77 ; 430/30; 430/5

Field of search: 355/77,53,43,45 430/30,5

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