Optical arrangement for exposure apparatus

U.S. Patent Number: 5394451

Abstract: An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.

Inventors: Miyake; Akira (Isehara, JP), Watanabe; Yutaka (Isehara, JP)

Assignee: Canon Kabushiki Kaisha (Tokyo, JP)

Application Number: 07/955,433

Issued: 1995-02-28

Expired: 2007-02-28

Classes: 378/34 ; 378/84; 378/85

Field of search: 378/34,35,84,85,43

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